SCM Archive

  • A few weeks ago, while I was in Boston, I sat down with a couple old friends for lunch. We like to talk about what’s happening in the industry and...

    Changing the PLM Landscape: PTC’s Acquisition of MKS

    A few weeks ago, while I was in Boston, I sat down with a couple old friends for lunch. We like to talk about what’s happening in the industry and...

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  • These two key characteristics are important when you start thinking about how each of these artifacts are being <i>authored</i> as that will directly affect the availability of any information embedded in the files or data it creates. Furthermore, it's important to think about how each of these artifacts are being <i>managed</i> as that will directly affect the propagation of engineering and design change into other dependent artifacts.

    Identifying Form, Fit and Function Artifacts in the Product Record

    These two key characteristics are important when you start thinking about how each of these artifacts are being authored as that will directly affect the availability of any information embedded in the files or data it creates. Furthermore, it's important to think about how each of these artifacts are being managed as that will directly affect the propagation of engineering and design change into other dependent artifacts.

    Continue Reading...